Committees
ORGANISING COMMITTEE
Conference Chair
John H Marsh, Intense Photonics Ltd
Programme Chair
Iain G. Thayne, University of Glasgow
Local Arrangements Chair
A. Catrina Bryce, University of Glasgow
Exhibition Chair
Chris Gracie, Scottish Optoelectronics Association
Short Course Chair
Alwyn J. Seeds, University College London
Publicity Chair
Steve Bland, IQE plc
Golf Chair
Wilson Sibbett, University of St Andrews
Sponsorship Chair
Karen Lamb
TECHNICAL COMMITTEE
Epitaxy Chair
Amy W.K.Liu, IQE Inc., USA
Electron Devices Chair
Tahir Hussain, HRL Laboratories, LLC, USA
Nanoelectronics and Novel Materials Chair
Bobby Brar, Rockwell Scientific, USA
Optoelectronics Chair
Prof. Eli Kapon, Swiss Federal Institute of Technology, Switzerland
Processing and Materials Integration Chair
Prof. Dr. Franz-Josef Tegude, Gerhard-Mercator-Universität Duisburg, Germany
Characterisation and Bulk Materials Chair
Roberto Fornari, Institut für Kristallzüchtung, Germany
BULK AND CHARACTERISATION COMMITTEE
Dr. David F. Bliss, Air Force Research Lab, USA
Prof. Roberto Fornari (CHAIRMAN), Institute for Crystal Growth (IKZ), Germany
Dr Ian Grant, Wafer Technology Ltd., United Kingdom
Prof. Juan Jiménez, Universidad de Valladolid, Spain
Prof. Georg Mueller, University Erlangen-Nuernberg, Germany
Prof. Tongnian Sun, Hebei Semiconductor Research Institute, P.R. China
Dr. Masami Tatsumi, Sumitomo Electric Industries, Japan
Processing and Materials Integration Committee
Franz-Josef Tegude (Chair), Universität Duisburg-Essen, Germany
Hideki Hasegawa, Hokkaido University, Japan
Hiroshi Ito, NTT Photonics Laboratories, Japan
Charles W. Tu, University of California, San Diego, USA
Ng Geok Ing, Nanyang Technological University, Singapore
Jan Grahn, Ph.D, Chalmers University of Technology, Sweden
Alfred Forchel, Julius-Maximilians-Universität, Würzburg, Germany
Epitaxy Committee
Amy Liu, IQE Inc., USA
David Chow, HRL Laboratories, LLC, USA
Russell Dupuis, Georgia Institute of Technology, USA
Colin Stanley, University of Glasgow, United Kingdom
Hajime Asahi, Osaka University, Japan
Henning Riechert, Infineon Technologies, Germany
Marcus Pessa, Tampere University of Technology, Finland
Tomoyuki Miyamoto, Tokyo Institute of Technology, Japan
Yohei Otoki, Hitachi-Cable Ltd., Japan
Electron Devices Committee
Dr Tahir Hussain, HRL, USA (Chair)
Prof. Peter Asbeck, UCSD, USA
Prof. Mark Rodwell, UCSB, USA
Prof. Jesus DelAlamo, MIT, USA
Dr. Y K Chen: Lucent Technology, USA
Dr. Koichi Murata: NTT, Japan
Dr. Keisuke Shinohara, Rockwell Science, USA Center (formerly of CRL Japan)
Dr. Kyung Ho Lee, ETRI, Korea
Prof Ali Rezazadeh, UMIST, UK
Nanoelectronics and Novel Materials
Bobby Brar, Rockwell Scientific, USA (Chair)
Roger Welser, Kopin Corporation, USA
Jenna Zinck, Hughes Research Labs, USA
Greg Snider, Univ of Notre Dame, USA
Meyya Meyyappan, NASA AMES, USA
Art Gossard, UCSB, USA
Prof Dieter Bimberg, Institut fuer Festkoerperphysik, Germany
Optoelectronics
Prof. Eli Kapon, Swiss Federal Institute of Technology, Switzerland
C. Chang-Hasnain, UC Berkeley, USA
S. Forrest, U. Princeton, USA
M. Amann, TU Munich, Germany
A. Forchel, U. Wurzburg, Germany
S. Arai, Tokyo Inst. Technol., Japan
Lars Thylen, Royal Institute of Technology, Sweden
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